Photolithographic Multispectral Filters
Precision Thin-Film Patterns: Achieved through the photolithographic method, ensuring high accuracy and performance.
Multi-Spectral Capabilities: Multiple thin-film coatings are assembled on a single substrate, allowing for the separation of light into multiple discrete spectral bands.
Compact Design: Facilitates more compact multi-spectral imaging systems, enhancing convenience and integration.
High Transmission Efficiency: Exceptional transmittance within the designated transmission bands.
Sharp Spectral Cut-on/Cut-off: Ensures precise isolation of specific spectral bands.
Durability: Coatings are deposited on optical-grade sapphire substrates known for their unparalleled hardness and resistance to challenging operational conditions.
Precision Standards: Achieves a premium precision standard of 10/5 S/D and ±5µm graphic dimensional tolerance.
Applications: Remote Sensing Image Processing, Medical Imaging, Biomedical Research, Environmental Monitoring, Industrial Inspection, etc.