Fabrication Technique: Chemical Vapor Deposition (CVD) is a method used to grow thin films or layers of materials onto a substrate under controlled conditions. It allows for precise control over material properties and thickness.

Maximum Diameter: Up to 280mm, indicating large-scale optical components.

Thermo-mechanical Properties: Excellent mechanical strength and endurance in hostile environments, suggesting durability and reliability.

Transmission Range: Wide transmission range from 7.5μm to 12μm (micrometers), which corresponds to the long-wave infrared (LWIR) region. High transmission rates in this range are crucial for infrared imaging and other applications.

Applications: Ideal for infrared imaging systems, missile guidance systems, scientific instruments, and other applications requiring precise infrared optics.