UV Fused Silica Laser Line Mirrors
Optimized Reflectivity: Provides high reflectivity in a narrow spectral range around the target wavelength, ensuring efficient laser light reflection.
Durable Substrate: Made of UV fused silica from Corning, known for its superior optical properties, high scratch resistance, and low thermal expansion.
Wide Range of Options: Available in a variety of specifications and options, including laser line mirrors for HeCd lasers, Ar+ lasers, Nd:YAG lasers, HeNe lasers, LD lasers, Yb:KGW/KYW lasers, and more.
High Reflectivity: Average reflectivity above 98% at an angle of incidence from 0-45°, regardless of the polarization state, with enhanced reflectivity up to 99% at 0° incidence.
Standard and Custom Versions: Offers both standard and custom versions of UVFS laser line mirrors to meet specific application requirements.
Low Group Delay Dispersion (GDD): Available in low GDD versions for ultrafast laser applications.
Applications: Laser Systems, Research and Development, Precision Instrumentation, Industrial Applications, etc.