Fused Silica and Optical Quartz Glass Wafers
High Purity & Chemical Stability: Similar to Fused Silica, Optical Quartz Glass Wafers offer high purity and excellent chemical stability.
Excellent optical properties: It has excellent transmittance in the continuous wavelength range from ultraviolet to infrared radiation, which is suitable for high-precision optical systems.
Good thermal and mechanical properties: It has a low coefficient of thermal expansion and high temperature resistance, and can withstand temperature changes without being easy to deform.
Wide range of applications: Due to its excellent performance, Optical Quartz Glass Wafers are widely used in semiconductors, optoelectronics, optical instruments, aerospace, and other fields.
Applications: Optical and Laser Systems, UV-light Sanitation, Semiconductors, Spacecraft, etc.
Fused Silica and Optical Quartz Glass Wafers or Substrates are essential components in various high-tech applications. These wafers, made from Fused Silica or Quartz Glass, come in a variety of dimensions and shapes, including thin discs and square plates.
Material Properties:
| Density (at 25°C / 77°F) | 2.201 g/cm^3 |
| Shear Modulus | 30.6 GPa |
| Young’s Modulus | 2.1 GPa |
| Bulk Modulus | 37.4 GPa |
| Modulus of Rupture, abraded | 52.4 MPa |
| Poisson’s Ratio | 0.179 |
| Knoop Hardness (100g load) | 522 kg/mm^2 |
| Compressive Strength | 1.14 GPa |
| Tensile Strength | 54 MPa |
| Strain Point | 893°C/1639.4°F |
| Thermal Expansion Coefficients | 0.52 ppm/K @5-35°C，0.57 ppm/K @0-200°C，0.48 ppm/K @-100 – 200°C |
| Annealing Point | 1042°C/1907.6°F |
| Softening Point | 1585°C/2885°F |
| Thermal Conductivity | 1.38 W/m·K |
| Thermal Diffusivity | 0.0075 cm^2/s |
| Specific Heat | 0.770 J/g·K |
| Refractive Index | Nd = 1.45840 @589nm |
| Dielectric Constant | E = 3.8 |
Features:
- High Purity & Chemical Stability: Similar to Fused Silica, Optical Quartz Glass Wafers offer high purity and excellent chemical stability.
- Excellent optical properties: It has excellent transmittance in the continuous wavelength range from ultraviolet to infrared radiation, which is suitable for high-precision optical systems.
- Good thermal and mechanical properties: It has a low coefficient of thermal expansion and high temperature resistance, and can withstand temperature changes without being easy to deform.
- Wide range of applications: Due to its excellent performance, Optical Quartz Glass Wafers are widely used in semiconductors, optoelectronics, optical instruments, aerospace, and other fields.
Applications:
- Optical and Laser Systems: Due to their excellent transmission and stability.
- UV-light Sanitation: Utilizing their high UV transmission.
- Semiconductors: With their thermal and chemical properties.
- Spacecraft: For components that endure extreme conditions.
Fused Silica and Optical Quartz Glass Wafers are indispensable key materials for many high-tech fields due to their excellent performance in purity, chemical stability, thermal properties, optical properties, and electrical insulation.
