LaAlO3 Substrates

Perovskite Crystal Structure: Offers a good lattice match to multiple materials with similar structures, facilitating epitaxial growth.

Wide Bandgap: Ensures high performance in electronic applications, especially at high frequencies.

Thermal Stability: Maintains integrity and performance in high-temperature environments.

Low Dielectric Loss: Suitable for high-frequency electronic applications due to minimal energy dissipation.

Applications: Electronics, Optics, Epitaxial Growth, Capacitors, Material Growth, etc.

LaAlO3, or Lanthanum Aluminate, is a single crystal with a perovskite crystal structure. Its properties make it an ideal substrate for various advanced applications in electronics, optics, and epitaxial growth.

Specifications:

Main performance parameters
crystal system Hexagonal (room temperature) Cube (>435°C)
Lattice constant Hexagonal a = 5.357A c = 13.22 A cubic a = 3.821 a
Melting point (°C) 2080
density 6.52(g/cm3
hardness 6-6.5(mohs)
Coefficient of thermal expansion 9.4×10-6/℃
Dielectric constant ε=21
Loss tangent (10GHz) ~3×10-4@300k,~0.6×10-4@77k
Color and appearance Depending on the annealing condition, the
brownish-yellow to brown polished substrates have natural twin domains
Chemical stability It is insoluble in mineral acid at room temperature, and soluble in h at temperatures greater than 150 °C3po4
peculiarity Suitable for microwave electronics
Growth method Tirafa
size 10×3,10×5,10×10,15×15,,20×15,20×20,
Ф15,Ф20,Ф1″,Ф2″,Ф2.6″

 

Key Features

  • Perovskite Crystal Structure: Offers a good lattice match to multiple materials with similar structures, facilitating epitaxial growth.
  • Wide Bandgap: Ensures high performance in electronic applications, especially at high frequencies.
  • Thermal Stability: Maintains integrity and performance in high-temperature environments.
  • Low Dielectric Loss: Suitable for high-frequency electronic applications due to minimal energy dissipation.

Applications:

  • Electronics: Ideal for high-frequency electronic devices due to its wide bandgap and low dielectric loss.
  • Optics: Used in optical applications requiring materials with high thermal stability and wide bandgap.
  • Epitaxial Growth: Serves as an indispensable platform for the growth and research of thin films and heterostructures.
  • Capacitors: High dielectric constant makes it useful in capacitor applications, improving energy storage capabilities.
  • Material Growth: Supports the epitaxial growth of complex oxides, high-temperature superconductors, magnetic materials, and multiferroics.

Kingwin Optics offers high-quality LaAlO3 wafers, both in stock and custom options, ensuring that you have the right substrate for your electronic, optical, and epitaxial growth needs. Our LaAlO3 substrates are prepared with precision to support advanced technological applications, ensuring optimal performance and reliability.